PHI 5000 VersaProbe III XPS - NanoFAB Confluence

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PHI 5000 VersaProbe III XPS

Overview

X-ray photoelectron spectroscopy (XPS/ESCA) is the most widely used surface analysis technique and has many well established industrial and research applications. XPS provides quantitative elemental and chemical state information from surfaces and thin film structures. XPS is applied to a diverse range of materials applications including: polymers, metals, catalysts, thin films, photovoltaics, batteries, wear coatings, nanomaterials, semiconductor devices, magnetic storage media, display technology, and biomedical devices.

The VersaProbe III is the next generation of PHI’s highly successful multi-technique XPS product line and provides a two to three-fold increase in sensitivity over the previous generation. Physical Electronics (PHI) is the leading supplier of surface analysis instrumentation and PHI XPS instruments are the only XPS instruments that are equipped with a micro-focused, raster scanned, x-ray beam that provides the unique capabilities associated with a scanning XPS microprobe while maintaining an uncompromised large area spectroscopy capability.

LMACS Name	XPS Versa Probe III (PHI 5000)
Confluence Label	phi-5000-versaprobe
Process Area	Characterization
Model	Physical Electronics - Versa Probe III 5000
Vendor	Spectra Research Corporation (https://www.spectraresearch.com)
Team	Peng Li Xuehai Tan Shihong Xu Devin Fortier
Location	CMEB - L1 -117

System Features

1	Imaging/mapping capability with spatial resolution of less than 10um
2	Low Energy Inverse Photoemission Spectroscopy (LEIPS)
3	Depth profile analysis of both organic and inorganic materials
4	Angle-Resolved XPS
5	Hot/cold stage providing temperatures of -140° C to +600° C

Documents

Operating Procedure	PHI 5000 VersaProbe XPS SOP & HA Listing

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