Purion XE Series | High Energy Ion Implantation - Axcelis
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High Energy
Purion XE Series high energy ion implanters
Our Purion XE series of ion implanters have rapidly earned a reputation as the industry standard for today’s demanding high energy recipes. Their unique RF Linear Accelerator (LINAC) technology offers higher reliability, a wider energy range and greater productivity than competing platforms, with superior metals contamination control.

Purity
The multi-filtration technology in our RF LINAC-based beamline filters out impurities other designs miss, achieving the industry’s lowest levels of metals and particulates contamination.
Precision
Proprietary VectorTM control system uniquely provides in-situ horizontal and vertical measurement and correction, enabling zero-degree implants.
Productivity
Achieve throughput of up to 500 WPH, thanks to our high-speed Purion End Station and our RF LINAC-based beamline, offering the industry’s highest beam currents over the broadest energy range—from 40keV to 15MeV.
Optimize Your Energy Level
The Purion High Energy Series includes a variety of implanters, allowing you to select the optimal energy level for your application:
- Purion XE—12-stage LINAC with energies up to 4.5 MeV
- Purion EXE—12-stage LINAC with higher energy than Purion XE up to 5.25 MeV
- Purion VXE—14-stage LINAC with energy booster, delivering energies up to 8 MeV
- Purion XEmax—Dual LINAC design with patented Boost TechnologyTM for the highest energies up to 15 MeV
- Purion XE Power Series+—XE and EXE models designed for high volume power devices aluminum implantation, 150mm SiC wafer handling or 200mm thin Si wafer handling
White Papers
Analysis of Very High Energy Implantation Profiles at Channeling and Non-Channeling Conditions Read the white paper
Acceleration of 4+ ions in an RF Linac Accelerator Read the white paper
Videos
Purion XE with Intelliscan
Watch the Video
Axcelis RF LINAC beamline
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Tell us about your semiconductor fab challenges and let Axcelis show you how to improve precision, purity and productivity.
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