Top 13+ C4h9f hay nhất
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1.2-Fluorobutane | C4H9F - PubChem
2-Fluorobutane | C4H9F | CID 3013860 - structure, chemical names, physical and chemical properties, classification, patents, literature, ...
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2.C4H9F Isomers - Molport
2-fluoro-2-methylpropane. Compound number. MolPort-006-111-231. SMILES. CC(C)(C)F. Molecular formula. C4H9F. Molecular weight.
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3.1-Fluorobutane | C4H9F - ChemSpider
ChemSpider 2D Image | 1-Fluorobutane | C4H9F. Save 3D Zoom. 1-Fluorobutane. Molecular FormulaC4H9F; Average mass76.113 Da; Monoisotopic mass76.068825 Da ...
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4.2-Fluorobutane | C4H9F - ChemSpider
ChemSpider 2D Image | 2-Fluorobutane | C4H9F. Save 3D Zoom. 2-Fluorobutane. Molecular FormulaC4H9F; Average mass76.113 Da; Monoisotopic mass76.068825 Da ...
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5.Butane, 1-fluoro- - The NIST WebBook
CAS Registry Number: 2366-52-1; Chemical structure: C4H9F View the 3d structure. Other names: Butyl fluoride; 1-Fluorobutane; Information on this page:.
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6.1-Fluorobutane | C4H9F | MD Topology | NMR | X-Ray
InChI=1S/C4H9F/c1-2-3-4-5/h2-4H2,1H3. IUPAC Name. 1-FLUOROBUTANE. Common Name, 1-Fluorobutane. Canonical SMILES (Daylight). CCCCF. Number of atoms, 14.
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7.Nitride Etching With Hydrofluorocarbons III: Comparison Of C 4 H 9 F ...
The performance of low-k nitride spacer etch processes for fin-field effect transistor device fabrication was investigated using C4H9F based and CH3F based ...
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8.C4H9F 1-Fluorobutane - ResearchGate
5 thg 7, 2022 · Download Citation | C4H9F 1-Fluorobutane | This document is part of Part 2 of Subvolume D 'Asymmetric Top Molecules' of Volume 29 'Molecular ...
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9.Formula:C4H9F - LookChem
Find information on molecules with molecular formula C4H9F. 1 chemical structures have molecular formula C4H9F.
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10.Structure Of 1-FLUOROBUTANE (C4H9F) - Mol-Instincts
What's the chemical formula of 1-FLUOROBUTANE? C4H9F. How many atoms and what are the elements included the 1-FLUOROBUTANE molecule? 14 atom(s). How ...
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11.Nitride Etching With Hydrofluorocarbons. II. Evaluation Of C4H9F For ...
Abstract. A novel etch chemistry, C4H9F was evaluated for highly selective patterning of SiN using both organic and SiOx masks for line/space and ...
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12.Nitride Etching With Hydrofluorocarbons III: Comparison Of C4H9F ...
The performance of low-k nitride spacer etch processes for fin-field effect transistor device fabrication was investigated using C4H9F based and CH3F based ...
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13.89 C4H9F 2-Fluoro-2-methylpropane - SpringerMaterials
This document is part of Subvolume C 'Symmetric Top Molecules' of Volume 29 'Molecular Constants Mostly from Microwave, Molecular Beam, and Sub-Doppler ...
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